Comment on China Has Reportedly Built Its First EUV Machine Prototype, Marking a Semiconductor Breakthrough the U.S. Has Feared All Along

• T4V0@lemmy.pt ⁨1⁩ ⁨month⁩ ago

  Found it! Nano Imprint Lithography (NIL).

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  • SaveTheTuaHawk@lemmy.ca ⁨1⁩ ⁨month⁩ ago

    Ok in a lab, but saying they will scale by 2027 is pure fiction.

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  • justaman123@lemmy.world ⁨1⁩ ⁨month⁩ ago

    Can someone smarter than me or at least more informed explain how this compares

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  • eleijeep@piefed.social ⁨1⁩ ⁨month⁩ ago

    Thanks. Oh yes, I heard about this technology (but not the latest update) from a youtube video. It’s completely insane!

    https://www.youtube.com/watch?v=8UdNB3ZY4Ks

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    • dubyakay@lemmy.ca ⁨1⁩ ⁨month⁩ ago

      Insanely good or Insanely stupid?

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      • eleijeep@piefed.social ⁨1⁩ ⁨month⁩ ago

        It has its pros and cons. Pros are that it’s faster and uses less energy and no complex optics system. Cons are that they have to replace the masks fairly regularly because they degrade with each imprint made. This probably also means that yields are lower towards the end of the life of the mask.

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